Thin Films of Metals, Metal Chalcogenides and Oxides Deposited at the Water-Oil Interface Using Molecular Precursors

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dc.contributor.authorThomas, John P.
dc.contributor.authorMubofu, Egid B.
dc.contributor.authorO'Brien, Paul
dc.date.accessioned2016-06-15T20:54:25Z
dc.date.available2016-06-15T20:54:25Z
dc.date.issued2012-10
dc.descriptionFull tyext can be accessed at http://pubs.rsc.org/en/content/articlehtml/2013/cc/c2cc37146den_US
dc.description.abstractThe interface between two immiscible liquids is emerging as a powerful medium for the growth and deposition of nanostructured thin films of metals and compound semiconductors. Materials obtained through this exceedingly simple route seem to often adopt fascinating forms and morphologies. In this article, we outline features unique to the interface that shape the striking deposits and highlight the nature and properties of nanostructured films obtained using this technique.en_US
dc.identifier.citationThomas, P.J., Mbufu, E. and O'Brien, P., 2013. Thin films of metals, metal chalcogenides and oxides deposited at the water–oil interface using molecular precursors. Chemical Communications, 49(2), pp.118-127.en_US
dc.identifier.doi10.1039/c2cc37146d
dc.identifier.urihttp://hdl.handle.net/20.500.11810/2490
dc.language.isoenen_US
dc.titleThin Films of Metals, Metal Chalcogenides and Oxides Deposited at the Water-Oil Interface Using Molecular Precursorsen_US
dc.typeJournal Articleen_US
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